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Technology Details

Technology Details

Heterogeneous Integration with Through silicon via technology

Electronics and Optoelectronics Optoelectronic Semiconductor Technology Electronic and optoelectronic packaging technology

Technology/Patent

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異質整合電路導通孔技術IMG
Summary
◆The TSV process is a key technology for 3D chip stacking by providing a route with the shortest and vertical interconnection path to replace the traditional wire-bonding process in chip/wafer stacking ◆TSV technology can increase chip density, reduce form factor, enhance bandwidth, cut power consumption, and improve product performance ◆via last through silicon via technology increase 60% system performance and reduce 70% power consumption in SRAM and logic chip stacking ◆via middle through silicon via with 4 layers 8Gb memory chip stacking ◆Dramatically reduce the package size and increase performance by integrating BSI CIS+ADC+ISP chip stacking
Data category
Technology
Data ID
S11204I0031
Inventor
Owner
Industrial Technology Research Institute(工業技術研究院)
Owner attribute
Research institution
Technology Maturity
Trial production
Sales Period (Start)
2023/04/10
Transaction method
Patent_exclusive license,Patent_non-exclusive license,Joint development,Negotiate by self,
Effective date of publication
2025/04/13
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